Other products
Most of these products are tailor-made and designed on the basis of our customers’ specifications.
Systems for electron beam lithography
Multiple electron beams can be used to write a pattern in a wafer instead of using UV light and an optical mask. This boosts flexibility in manufacturing small volumes and prototyping.
Electron sources for application in research and development.
Electron optical components for STM/AFM, LEEM and XPS.